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Volume 40 Issue 5
Jul.  2022
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Article Navigation >  ENVIRONMENTAL ENGINEERING  > 2022  >  40(5): 1-8
ZHAO Yan, GUO Jia-lin, SHI Yang, WU Zhi-qi, JIANG Bin-hui. A GROUNDWATER INFLOW PREDICTION METHOD FOR FUSHUN WEST OPEN-PIT MINE BASED ON GMS[J]. ENVIRONMENTAL ENGINEERING , 2021, 39(1): 75-79,129. doi: 10.13205/j.hjgc.202101011
Citation: JIE Ya-wei, XU Ran-yun, DING Wei, JIANG Yi-heng, ZHANG Ben, LIU Hong-yuan. AOX FORMATION DURING THE ADVANCED OXIDATION OF PHENOL WASTEWATER CONTAINING CHLORIDE ION[J]. ENVIRONMENTAL ENGINEERING , 2022, 40(5): 1-8. doi: 10.13205/j.hjgc.202205001
shu

AOX FORMATION DURING THE ADVANCED OXIDATION OF PHENOL WASTEWATER CONTAINING CHLORIDE ION

doi: 10.13205/j.hjgc.202205001

  • 1. College of Civil Engineering, Zhejiang University of Technology, Hangzhou 310023, China;

  • 2. School of Environment, Tsinghua University, Beijing 100084, China;

  • 3. Technical Center for Ecology and Environment of Zhoushan, Zhoushan 316000, China

  • Received Date: 2021-06-25
    Available Online: 2022-07-02
    Abstract
  • The high concentration of chloride ions prevalent in refractory industrial wastewater affects the performance of advanced oxidation and generates harmful organochlorine by-products. In this study, phenol was selected as the target pollutant and the generation of adsorbable organic halogens(AOX) during its oxidation by two typical advanced oxidation processes, namely UV/PDS and UV/H2O2, were investigated in the presence of Cl-. The results showed that UV/PDS was more effective than UV/H2O2 in the degradation and mineralization of phenol under experimental conditions in the presence of 1000 mg/L and 10000 mg/L Cl-. However, the AOX concentration formed during UV/PDS oxidation was about 10 times higher than that in UV/H2O2. The UV/H2O2 process tended to form more AOX under strongly acidic conditions(pH=3), while the AOX generation in the UV/PDS process was not significantly affected by the initial pH. Simulations of the steady-state concentrations of the four chlorine radicals revealed that the chlorine radical concentration increased for 1~2 orders of magnitude, when Cl- increased from 1000 mg/L to 10000 mg/L. The concentration in the UV/PDS system was significantly higher than that in UV/H2O2, which may be an important reason for the significant difference in AOX observed in the two advanced oxidation processes under different conditions. Similarly, the UV/PDS generated more AOX when treating actual wastewater, and the effect of organic structure and composition in wastewater on AOX generation was stronger than the effect of TOC concentration in wastewater.
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