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Volume 43 Issue 8
Aug.  2025
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LIU Jianli, WANG Junying, TU Xiang, LI Xueyan. Removal of antibiotic resistance genes from secondary effluent of a wastewater treatment plant using UV/sodium chlorite treatment[J]. ENVIRONMENTAL ENGINEERING , 2025, 43(8): 28-39. doi: 10.13205/j.hjgc.202508002
Citation: LIU Jianli, WANG Junying, TU Xiang, LI Xueyan. Removal of antibiotic resistance genes from secondary effluent of a wastewater treatment plant using UV/sodium chlorite treatment[J]. ENVIRONMENTAL ENGINEERING , 2025, 43(8): 28-39. doi: 10.13205/j.hjgc.202508002

Removal of antibiotic resistance genes from secondary effluent of a wastewater treatment plant using UV/sodium chlorite treatment

doi: 10.13205/j.hjgc.202508002
  • Received Date: 2025-05-20
  • Accepted Date: 2025-07-08
  • Rev Recd Date: 2025-06-18
  • This study focused on the secondary effluent of a municipal wastewater treatment plant in Beijing, investigated the removal efficiency of antibiotic resistance genes (ARGs) using an advanced oxidation process (AOP) combining ultraviolet (UV) light and sodium chlorite (NaClO2). The variations in absolute abundance of nine typical ARGs (tetAaadAlnuBblaTEMermFqnrSintI1sul1sul2) were analyzed using real-time quantitative PCR (qPCR), revealing the impact of water environmental parameters on ARGs removal in the UV/NaClO2 process. The results indicated that the UV/NaClO2 process significantly outperformed individual UV disinfection or NaClO2 disinfection in removing ARGs from secondary effluent. With UV disinfection alone, the maximum removal efficiency for 16S rRNA was 74.2%, while with NaClO2 disinfection alone, the removal efficiency for 16S rRNA reached a maximum of 75.6%, when the NaClO2 dosage was 0.9 g/L. Under the optimal treatment conditions of UV/NaClO2 (UV254/0.54 g/L NaClO2), the removal efficiency for 16S rRNA reached 99.5%, and the overall ARGs removal efficiency reached 99.9%. Notably, the removal of sulfonamide-resistant genes, sul1 and sul2, was particularly effective. The optimal disinfection time for the UV/NaClO2 advanced oxidation process was 30 minutes, with removal efficiencies for genes such as ermF, aadA, and tetA exceeding 99.9%. Water environmental factors significantly impacted the removal efficiency of the UV/NaClO2 process. The results showed that neutral conditions(pH=7) were more favorable for ARGs removal. The presence of different concentrations of Cl-, HCO3-, and natural organic matter (NOM) in the UV/NaClO2 system inhibited the removal of ARGs. This study provides theoretical support for the application of the UV/NaClO2 advanced oxidation process in wastewater effluent disinfection, as well as scientific guidance for optimizing process parameters and improving ARGs removal efficiency.
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