AOX FORMATION DURING THE ADVANCED OXIDATION OF PHENOL WASTEWATER CONTAINING CHLORIDE ION

JIE Ya-wei; XU Ran-yun; DING Wei; JIANG Yi-heng; ZHANG Ben; LIU Hong-yuan

doi:10.13205/j.hjgc.202205001

Volume 40 Issue 5

Jul. 2022

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JIE Ya-wei, XU Ran-yun, DING Wei, JIANG Yi-heng, ZHANG Ben, LIU Hong-yuan. AOX FORMATION DURING THE ADVANCED OXIDATION OF PHENOL WASTEWATER CONTAINING CHLORIDE ION[J]. ENVIRONMENTAL ENGINEERING , 2022, 40(5): 1-8. doi: 10.13205/j.hjgc.202205001

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JIE Ya-wei, XU Ran-yun, DING Wei, JIANG Yi-heng, ZHANG Ben, LIU Hong-yuan. AOX FORMATION DURING THE ADVANCED OXIDATION OF PHENOL WASTEWATER CONTAINING CHLORIDE ION[J]. ENVIRONMENTAL ENGINEERING , 2022, 40(5): 1-8. doi: 10.13205/j.hjgc.202205001

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AOX FORMATION DURING THE ADVANCED OXIDATION OF PHENOL WASTEWATER CONTAINING CHLORIDE ION

doi: 10.13205/j.hjgc.202205001

1. College of Civil Engineering, Zhejiang University of Technology, Hangzhou 310023, China;
2. School of Environment, Tsinghua University, Beijing 100084, China;
3. Technical Center for Ecology and Environment of Zhoushan, Zhoushan 316000, China

Received Date: 2021-06-25
Available Online: 2022-07-02

Abstract

Abstract

The high concentration of chloride ions prevalent in refractory industrial wastewater affects the performance of advanced oxidation and generates harmful organochlorine by-products. In this study, phenol was selected as the target pollutant and the generation of adsorbable organic halogens(AOX) during its oxidation by two typical advanced oxidation processes, namely UV/PDS and UV/H₂O₂, were investigated in the presence of Cl^-. The results showed that UV/PDS was more effective than UV/H₂O₂ in the degradation and mineralization of phenol under experimental conditions in the presence of 1000 mg/L and 10000 mg/L Cl^-. However, the AOX concentration formed during UV/PDS oxidation was about 10 times higher than that in UV/H₂O₂. The UV/H₂O₂ process tended to form more AOX under strongly acidic conditions(pH=3), while the AOX generation in the UV/PDS process was not significantly affected by the initial pH. Simulations of the steady-state concentrations of the four chlorine radicals revealed that the chlorine radical concentration increased for 1~2 orders of magnitude, when Cl^- increased from 1000 mg/L to 10000 mg/L. The concentration in the UV/PDS system was significantly higher than that in UV/H₂O₂, which may be an important reason for the significant difference in AOX observed in the two advanced oxidation processes under different conditions. Similarly, the UV/PDS generated more AOX when treating actual wastewater, and the effect of organic structure and composition in wastewater on AOX generation was stronger than the effect of TOC concentration in wastewater.
- chloride ion,
- phenol,
- adsorbable organic halogens,
- UV/PDS,
- UV/H₂O₂

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References(34)

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